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The Newcastle University research output collection, currently available on ePrints, will shortly be moving to a new open repository platform, Figshare. To prepare for the data migration we have paused adding new content to ePrints, and will resume once the new repository is launched. During this time you will continue to have access to ePrints (but no new content will appear). We will share updates here when available.

Strained Si/SiGe MOS technology: Improving gate dielectric integrity

Lookup NU author(s): Dr Sarah OlsenORCiD, Liang Yan, Dr Enrique Escobedo-Cousin, Professor Anthony O'Neill

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Publication metadata

Author(s): Olsen SH, Yan L, Agaiby R, Escobedo-Cousin E, O'Neill AG, Hellström PE, Ostling M, Lyutovich K, Kasper E, Claeys C, Parker EHC

Publication type: Article

Publication status: Published

Journal: Microelectronic Engineering

Year: 2009

Volume: 86

Issue: 3

Pages: 218-223

ISSN (print): 0167-9317

ISSN (electronic): 1873-5568

Publisher: Elsevier

URL: http://dx.doi.org/10.1016/j.mee.2008.08.001

DOI: 10.1016/j.mee.2008.08.001


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