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Gold Nitride: Preparation and Properties

Lookup NU author(s): Professor Lidija SillerORCiD, Luís Alves, Dr Abel Brieva, Dr Yuriy Butenko

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Abstract

We review the currently known methods of producing gold nitride and report on the influence of electrically isolated substrates on the growth of gold nitride films by reactive ion sputtering (RIS). It is found that isolation of the substrate decreases grain size and increases nitrogen content, the latter attributed to longer nitrogen ion lifetime on the surface of the growing film. The chemical reactivity of gold nitride is compared with that of pure gold films using the adsorption of 1-dodecyl mercaptan (CH3(CH2)(11)SH) as a model system and it is found that there is no significant difference between gold films and gold nitride in terms of Au-S binding. However, gold nitride nanoparticles are suggested to be worthy of further investigation in terms of their catalytic properties.

Publication metadata

Author(s): Siller L, Alves L, Brieva AC, Butenko YV, Hunt MRC

Publication type: Article

Publication status: Published

Journal: Topics in Catalysis

Year: 2009

Volume: 52

Issue: 11

Pages: 1604-1610

ISSN (print): 1022-5528

ISSN (electronic): 1572-9028

Publisher: Springer New York LLC

URL: http://dx.doi.org/10.1007/s11244-009-9281-6

DOI: 10.1007/s11244-009-9281-6

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