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The Newcastle University research output collection, currently available on ePrints, will shortly be moving to a new open repository platform, Figshare. To prepare for the data migration we have paused adding new content to ePrints, and will resume once the new repository is launched. During this time you will continue to have access to ePrints (but no new content will appear). We will share updates here when available.

Fowler-Nordheim tunnelling in strained Si/SiGe MOS devices: impact of cross-hatching and nanoscale roughness

Lookup NU author(s): Dr Kelvin Kwa, Dr Sarah OlsenORCiD, Professor Anthony O'Neill, Dr Sanatan Chattopadhyay, Goutan Dalapati, Luke Driscoll

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Publication metadata

Author(s): Kwa KSK, Olsen SH, O'Neill AG, Chattopadhyay S, Dalapati G, Driscoll LS

Publication type: Conference Proceedings (inc. Abstract)

Publication status: Published

Conference Name: Proceedings of the Electronic Materials Conference

Year of Conference: 2005


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